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Nanoscale Topography: New Method of Etching Semiconductors Increases Precision

Released Friday, 28th September 2012

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Nanoscale Topography: New Method of Etching Semiconductors Increases Precision

Friday, 28th September 2012

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Watch a demonstration of a new optical method of etching semiconductors. For more information: http://www.nature.com/lsa/index.html http://light.ece.illinois.edu/ http://psl.mntl.illinois.edu/

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